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The shuttle plant is a simple possibility for slightly increasing the efficiency of a plant for plasma surface treatment. It consists of a controller, a treatment chamber and a second chamber floor.
Whilst a treatment process is running on chamber floor 1 with positioned chamber hood, a new charge can be prepared on chamber floor 2. When the charge on chamber floor 1 has cooled down sufficiently for the chamber to be opened, the lifting device positions the chamber hood over chamber floor 2 and a new process can start there.
Saving: The loading and unloading times for each charge.
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