| 1978 |
Development of PulsPlasma® technology with the intention to suppress the well known difficulties of the DC plasma nitriding like arcing and irregularities of temperature. |
| 1983 |
Delivery of the first plant for PulsPlasma® nitriding which is still used today.
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| 1985 |
Delivery of the first plant for the industrial development of the PA CVD technology for TiN coatings.
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| 1986 |
Foundation of the PlaTeG GmbH (PlaTeG) in Siegen and erection of the first industrial PulsePlasma nitriding plant worldwide with hot wall furnace.
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| 1989 |
Delivery of an industrial plant for PA CVD coatings. |
| 1990 |
Delivery of the first plant for PulsePlasma nitriding for the market of North America. |
| 1993 |
Erection and delivery of plants for cleaning and activation by RF/HF plasma excitation. |
| 1994 |
Relocation into larger manufacturing sectors and offices. |
| 1996 |
Erection of a plant for the cleaning of plastics and metal. This plant is a combination of conventional cleaning on alcoholic basis and cleaning with the assistance of RF and DC plasma excitation. |
| 1997 |
Delivery of a production plant including process technology for the PA CVD coatings of stamptools (TiN, TiC).
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| 1998 |
Delivery of the first plant for PA CVD coating for the Asian market.
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| 2000 |
Development and delivery of the biggest plant worldwide for Plasma sterilization.
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| 2001 |
Delivery of the biggest plant worldwide for Plasma activation of plastic parts used in the Automobile industry.
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| 2002 |
Extension of manufacturing sectors and offices to the fourfold size than before.
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Comment: Altogether more than 100 plants or essential plant components were delivered to customers in West Europe and North America. |
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